System Control Software
AdNaFilm's self-developed RF ion source features a two-layer grid structure for ion extraction, complete with an easy-to-maintain, self-aligning design. The RF antenna is a spiral coil design.
It is equipped with an advanced gas flow control system that precisely regulates working gas flow, thereby stabilizing ion beam performance.
The RF ion source's control system also includes a precisely adjusted fixed capacitor matcher, balancing both stability and equipment cost. Furthermore, the grids can be made from corrosion-resistant materials such as molybdenum, titanium, or graphite, depending on the application, significantly extending the equipment's lifespan.
It is equipped with an advanced gas flow control system that precisely regulates working gas flow, thereby stabilizing ion beam performance.
The RF ion source's control system also includes a precisely adjusted fixed capacitor matcher, balancing both stability and equipment cost. Furthermore, the grids can be made from corrosion-resistant materials such as molybdenum, titanium, or graphite, depending on the application, significantly extending the equipment's lifespan.
300mm RFICP离子源
Include
- 离子束直径：Φ 300 mm
- Discharge：RF,无灯丝
- 离子电流：>1500 mA
- 离子能量：400-1200 V
- Max RF Power ： 2000 W
- 离子束形式：平行
- 栅极材质：钼、钛、石墨
- 栅极结构：三层
- 气体流量：10-200 sccm
- 工艺气体：Ar、Xe、O2、N2、H2、CF4、C3F8
- 工作压力：< 5E-4 Torr
Manipulator 五軸樣品架
5 Axis Rotation and Tilted –Water Cooling and SiC Heating
| Parameter2 | Value |
|---|---|
|
Bilayer Materials
|
HfO2/Ta2O5 (H) and SiO2 (L)
|
|
Substrate(S) material
|
Fused Silica
|
|
Thickness of (H) and (L)
|
~100nm & ~250nm
|
|
No of Bilayers(N)
|
25 |
|
Grating structuring layer (G)
|
1900nm-2000nm
|
|
Grating structuring layer Material
|
SiO2
|
|
Configuration
|
〖𝑆[𝐻𝐿]〗^𝑁 𝐻𝐺𝐴
|
|
Substrate size(L*B*H) (mm)
|
75*75*10
|
|
Substrate (Form error, roughness)
|
𝜆/10 𝜆@632.8nm , 1Å – 3Å (RMS)
|
EUV optics Mo/Si 40 Multi Layer
Beam ON
AdNaFilm’s IBSD
Ion-Beam Sputter Deposition (IBSD) is a thin-layer deposition method in which the mechanism of ion production is separate from the target.
The ion source generate ions from a hot filament by collisions with electrons that are confined by a magnetic field.
The ions are then accelerated toward the target material by an electric field from a grid. As the ions leave the ion source they can be (depending on the design) neutralized by electrons from a second external filament.
The ions/neutral atom will then strike the atoms on the surface of the target thus removing target atoms by momentum transfer.
These atoms are then condensed onto the substrate as a thin film.
The ion source generate ions from a hot filament by collisions with electrons that are confined by a magnetic field.
The ions are then accelerated toward the target material by an electric field from a grid. As the ions leave the ion source they can be (depending on the design) neutralized by electrons from a second external filament.
The ions/neutral atom will then strike the atoms on the surface of the target thus removing target atoms by momentum transfer.
These atoms are then condensed onto the substrate as a thin film.
The advantage of IBSD is that the energy and flux of ions can be controlled and measured independently.
Since the ion beam current can be monitored during the deposition process, this parameter can serve as a quantitative measure for the deposited amount of material.
Also, since the flux that strikes the target is composed of neutral atoms, either insulating or conducting targets can be sputtered.
AdNaFilm's IBSD system is designed to maintain UHV conditions, also the sample handling and over-all design are precisely calculated to ensure deposition of high quality films.
AdNaFilm's FBBear Control Software makes IBSD operation reliable and hassle-free. In addition, our vast-experience and long-term cooperation with our customers continuously improve and optimize our systems.
Since the ion beam current can be monitored during the deposition process, this parameter can serve as a quantitative measure for the deposited amount of material.
Also, since the flux that strikes the target is composed of neutral atoms, either insulating or conducting targets can be sputtered.
AdNaFilm's IBSD system is designed to maintain UHV conditions, also the sample handling and over-all design are precisely calculated to ensure deposition of high quality films.
AdNaFilm's FBBear Control Software makes IBSD operation reliable and hassle-free. In addition, our vast-experience and long-term cooperation with our customers continuously improve and optimize our systems.
AdNaFilm’s Ion Beam Sputtering Deposition (IBSD) can deposit large-scale thin-film with extremely high quality and a great repeatability.
IBSD utilizes ion source to generate a focused ion beam directed at the target to be sputtered.
Since the target material is ablated by momentum transfer rather than a chemical or thermal process, any material can be deposited on the substrate (whether it is conductor, or insulator).
IBSD utilizes ion source to generate a focused ion beam directed at the target to be sputtered.
Since the target material is ablated by momentum transfer rather than a chemical or thermal process, any material can be deposited on the substrate (whether it is conductor, or insulator).
Target holders are designed to have multiple faces that allows deposition of different targets by means of rotation.
In addition, ion beam assisted sputtering source is included that allows gradual transition between the substrate material and the deposited film, by reducing crystal strain.
And, together with the mask system, this will allow formation of unique deposition pattern on the thin film.
In addition, ion beam assisted sputtering source is included that allows gradual transition between the substrate material and the deposited film, by reducing crystal strain.
And, together with the mask system, this will allow formation of unique deposition pattern on the thin film.
Main Specifications
- Custom-type SS316L electro-polished chamber
- 5E-7 Torr Base Pressure
- Vacuum pumps and gauges
- 4-in substrate
- 4-axes sample manipulator (XYZ, and Rotation)
- Water cooling manipulator
- Ion Beam Deposition and assist Source (Gridded - RFICP / KDC; or Gridless - EH)
- 4 Sputter cathodes
- Cube-type target assembly
- Thickness monitor
- FBBeam System Control Software
Optional
- O2 or N2 plasma source
- Ion beam assisted deposition system
- Pre-annealing heating system in Load Lock
- Chamber designs are customizable
- Sputter Cathodes
Major Applications
- High quality film
- Low background pressure
- Control of beam energy, current, species, and incident angle
- All parameters can be control almost independently in a wide range
- Congruent evaporation
- Versatile method (any material)
System Control Software
FBBEAR software is a multi-functional software to control the whole IBSD - 20 system, i.e. Manipulator rotation speed, heating program, target revolution, etc.
FBBEAR can control EUROTHERMO2408 to control, tune and save multi-PID parameters for laser/filament heater for the best accuracy of different substrate temperature requirements.
FBBEAR’s Deposition wizard make it hassle free to set, customize and save your experimental recipe and fully automatize the deposition processes.
This also allows easy repetition of the deposition process having same experimental parameters. In addition, it also allows recording of data log in order to review past deposition parameters.
FBBear can do data processing and analysis.
FBBEAR can control EUROTHERMO2408 to control, tune and save multi-PID parameters for laser/filament heater for the best accuracy of different substrate temperature requirements.
FBBEAR’s Deposition wizard make it hassle free to set, customize and save your experimental recipe and fully automatize the deposition processes.
This also allows easy repetition of the deposition process having same experimental parameters. In addition, it also allows recording of data log in order to review past deposition parameters.
FBBear can do data processing and analysis.