EBS - 150 Inquiry Categories: E-Beam Evaporator Categories Menu Deposition System Thermo Evaporator E-Beam Evaporator Quantum Computing Deposition System Magnetron Sputtering Systems Molecular Beam Epitaxy (MBE) Pulsed Laser Deposition (PLD) Ion-Beam Sputter Deposition _IBSD Linear and cluster system Plasma System Reactive-Ion Etching ( RIE ) Inductively Coupled Plasma ( ICP ) Electron Cyclotron Resonance ( ECR ) Ion Beam Etching Uhv Design & Components Laser Heating This equipment is a standard left-right load lock chamber, deposition chamber for Josephson junction or other application, it has an E-beam source in deposition chamber, Load lock. EBS - 150 Feature Load Lock:5E-7 torr Base pressure: 5E-9 torr Manipulator UHV E-gun Fully automatic process Via software control E-beam coating Chrome E-beam + Thermo + Effusion cell
